doc. Mgr. Pavel Souček, Ph.D.
Associate professor, Deposition of Thin films and Nanostructures
office: pav. 06/01009
Kotlářská 267/2
611 37 Brno
phone: | +420 549 49 8769 |
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e‑mail: | 175085@mail.muni.cz |
social and academic networks: |
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Total number of publications: 198
2025
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Effects of nitrogen content on microstructure and mechanical properties of DC magnetron sputtered Cr-Mn-Mo-Si-Y-(N) high entropy coatings
Surface and Coatings Technology, year: 2025, volume: 497, edition: February, DOI
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Exploring different approaches of multipulse HiPIMS
Surface and Coatings Technology, year: 2025, volume: 496, edition: January, DOI
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Industrial reactive sputter deposition of TiZrN coatings: The role of nitrogen partial pressure
Surface and Coatings Technology, year: 2025, volume: 499, edition: March, DOI
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Influence of oxygen flow on the structure, chemical composition, and dielectric strength of AlxTayOz thin films deposited by pulsed-DC reactive magnetron sputtering
Surface and Coatings Technology, year: 2025, volume: 498, edition: February, DOI
2024
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A Long-Term Study on the Bactericidal Effect of ZrN-Cu Nanostructured Coatings Deposited by an Industrial Physical Vapor Deposition System
Nanomaterials, year: 2024, volume: 14, edition: 6, DOI
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Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications
Vacuum, year: 2024, volume: 221, edition: March, DOI
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Effect of Nb incorporation in Mo BC coatings on structural and mechanical properties — Ab initio modelling and experiment
Acta Materialia, year: 2024, volume: 268, edition: April 2024, DOI
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Effects of Nitrogen Content on Microstructure and Mechanical Properties of High Entropy Nitride Coatings: DC Magnetron Sputtered Cr-Mn-Mo-Si-Y-(N) System
Year: 2024, type: Conference abstract
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Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering
Surface and Coatings Technology, year: 2024, volume: 489, edition: August 2024, DOI
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On the influence of strong- and weak-nitride forming elements on the preparation of refractory metal based high entropy nitrides by magnetron sputtering
Year: 2024, type: Conference abstract