prof. Mgr. Petr Vašina, Ph.D.
Department head, Department of Plasma Physics and Technology
Office: pav. 06/01025
Kotlářská 267/2
611 37 Brno
Phone: | +420 549 49 6479 |
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social and academic networks: |
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Total number of publications: 387
2024
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A Long-Term Study on the Bactericidal Effect of ZrN-Cu Nanostructured Coatings Deposited by an Industrial Physical Vapor Deposition System
Nanomaterials, year: 2024, volume: 14, edition: 6, DOI
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Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications
Vacuum, year: 2024, volume: 221, edition: March, DOI
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Effect of Nb incorporation in Mo BC coatings on structural and mechanical properties — Ab initio modelling and experiment
Acta Materialia, year: 2024, volume: 268, edition: April 2024, DOI
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Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering
Surface and Coatings Technology, year: 2024, volume: 489, edition: August 2024, DOI
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Floating potential probes for process control during reactive magnetron sputtering
Surface and Coatings Technology, year: 2024, volume: 494, edition: October 2024, DOI
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On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species
Surface and Coatings Technology, year: 2024, volume: 487, edition: July 2024, DOI
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On the influence of strong- and weak-nitride forming elements on the preparation of refractory metal based high entropy nitrides by magnetron sputtering
Year: 2024, type: Conference abstract
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Spatially resolved optical emission analysis of spokes in HiPIMS utilising Al, Cr, Cu, Ti, and W targets
Plasma Sources Science and Technology, year: 2024, volume: 33, edition: 6, DOI
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Synthesis and characterization of ceramic high entropy carbide thin films from the Cr-Hf-Mo-Ta-W refractory metal system
Surface and Coatings Technology, year: 2024, volume: 485, edition: June 2024, DOI
2023
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Describing the multipulse HiPIMS deposition
Year: 2023, type: