Publication details
PROPERTIES OF MODIFIED AMORPHOUS CARBON THIN FILMS DEPOSITED BY PECVD
| Authors | |
|---|---|
| Year of publication | 2012 |
| Type | Article in Periodical |
| Magazine / Source | Chem. listy |
| MU Faculty or unit | |
| Citation | |
| web | http://www.chemicke-listy.cz/common/content-issue_s5-volume_106-year_2012.html |
| Field | Plasma physics |
| Keywords | RF-PECVD; amorphous carbon; protective coatings; DLC; |
| Description | The aim of this work was to prepare a set of DLC films from different mixtures of precursor gases (methane, hydrogen, deuterium, nitrogen and/or HMDSO) using RFPECVD on substrates such as crystalline silicon, glass, and steel. The prepared films were characterized by several diagnostic tools and the properties of hydrogenated amorphous carbon films and the modified diamond-like carbon thin films with different admixtures (N, Si, O, D) were compared. Mechanical tests were performed on the obtained films mainly using depth sensing indentation method. We focused our attention on the following coating properties: hardness, elastic modulus, fracture toughness, film-substrate adhesion. Additionally, the effect of the internal stress on the indentation response of the filmsubstrate systems was studied. The tribological properties of the films were also investigated. The surface free energy of the films was performed by contact angle measuring technique. |
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