Publication details
PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure
| Authors | |
|---|---|
| Year of publication | 2013 |
| Type | Article in Periodical |
| Magazine / Source | J. Phys. D: Appl. Phys. |
| MU Faculty or unit | |
| Citation | |
| web | http://iopscience.iop.org/0022-3727/46/33/335202/ |
| Doi | http://dx.doi.org/10.1088/0022-3727/46/33/335202 |
| Field | Plasma physics |
| Keywords | PECVD; modulated; microwave; plasma jet; atmospheric pressure |
| Attached files | |
| Description | We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a microwave plasma jet operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS). |
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