Publication details

PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure

Investor logo
Investor logo
Authors

HNILICA Jaroslav SCHÄFER Jan FOEST Rüdiger ZAJÍČKOVÁ Lenka KUDRLE Vít

Year of publication 2013
Type Article in Periodical
Magazine / Source J. Phys. D: Appl. Phys.
MU Faculty or unit

Faculty of Science

Citation
Web http://iopscience.iop.org/0022-3727/46/33/335202/
Doi http://dx.doi.org/10.1088/0022-3727/46/33/335202
Field Plasma physics
Keywords PECVD; modulated; microwave; plasma jet; atmospheric pressure
Attached files
Description We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a microwave plasma jet operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS).
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info