Publication details
NITROGEN DOPED ORGANOSILICON PLASMA POLYMERS FOR BIOAPPLICATIONS
| Authors | |
|---|---|
| Year of publication | 2016 |
| Type | Conference abstract |
| MU Faculty or unit | |
| Citation | |
| Description | The aim of the present work was to prepare organosilicon thin films with amine functionalities on single crystalline silicon substrates using plasma enhanced chemical 81 vapor deposition (PECVD). The film properties prospective for bioapplications (surface free energy, resistance against mechanical damage, chemical composition, i.e. the presence of primary and secondary amines) were studied. |
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