Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

• Authors: FALUB Claudiu V.; ROHRMANN Hartmut; BLESS Martin; MEDUŇA Mojmír; MARIONI Miguel; SCHNEIDER Daniel; RICHTER Jan H.; PADRUN Marco
• Year of publication: 2017
• Type: Article in Periodical
• Magazine / Source: AIP Advances
• MU Faculty or unit: Faculty of Science
• Web: http://aip.scitation.org/doi/abs/10.1063/1.4973945
• Doi: http://dx.doi.org/10.1063/1.4973945
• Field: Solid matter physics and magnetism
• Keywords: ferromagnetic-resonance frequency; on-chip inductors; x-ray-scattering; thin-films; roughness; anisotropy; band
• Description: Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system.

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