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Publication details
Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses
Authors | |
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Year of publication | 1996 |
Type | Article in Periodical |
Magazine / Source | Thin Solid Films |
MU Faculty or unit | |
Citation | |
Field | Plasma physics |
Keywords | PECVD; TEOS |
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