Publication details
Properties of Silicon Containing Thin Films Deposited by PECVD
| Authors | |
|---|---|
| Year of publication | 1998 |
| Type | Article in Proceedings |
| Conference | International Workshop on Diagnostics of Solid State Surfaces and Interfaces |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | plasma enhanced CVD |
| Description | Properties of Silicon Containing Thin Films Deposited by PECVD |