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Publication details
Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds
Authors | |
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Year of publication | 1999 |
Type | Article in Periodical |
Magazine / Source | Thin Solid Films |
MU Faculty or unit | |
Citation | |
Field | Plasma physics |
Keywords | PECVD; OMTS |
Description | Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds |
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