Publication details
Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds
Authors | |
---|---|
Year of publication | 1999 |
Type | Article in Periodical |
Magazine / Source | Thin Solid Films |
MU Faculty or unit | |
Citation | |
Field | Plasma physics |
Keywords | PECVD; OMTS |
Description | Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds |
Related projects: |