Publication details

Self-Aligned Photonic Defect Microcavity Lasers with Site-Controlled Quantum Dots

Authors

SHIH Ching-Wen LIMAME Imad PALEKAR Chirag C. KOULAS-SIMOS Aris KAGANSKIY Arsenty KLENOVSKÝ Petr REITZENSTEIN Stephan

Year of publication 2024
Type Article in Periodical
Magazine / Source Laser and Photonics Reviews
MU Faculty or unit

Faculty of Science

Citation
Web https://onlinelibrary.wiley.com/doi/10.1002/lpor.202301242
Doi http://dx.doi.org/10.1002/lpor.202301242
Keywords buried-stressor method; microlasers; nanolasers; photonic microcavities;scalable quantum light sources; site-controlled quantum dots; vertical-cavity surface-emitting lasers
Description Self-assembled semiconductor quantum dots face challenges in terms of scalable device integration because of their random growth positions, originating from the Stranski–Krastanov growth mode. Even with existing site-controlled growth techniques, for example, nanohole or buried stressor concepts, a further lithography and etching step with high spatial alignment requirements is necessary to accurately integrate quantum dots into the nanophotonic devices. Here, the fabrication and characterization of strain-induced site-controlled microcavities are reported, where site-controlled quantum dots are positioned at the antinode of the optical mode field in a self-aligned manner without the need of any further nano-processing. It is shown that the cavity properties such as Q-factor, mode volume, and mode splitting can be tailored by the geometry of the integrated buried stressor, with an opening <4 µm. The experimental results are complemented with theory calculations based on continuum elasticity. Lasing signatures, including super-linear input-output response and linewidth narrowing, are observed for a 3.6-µm self-aligned cavity with a Q-factor of 18 000. Furthermore, the quasi-planar site-controlled cavities exhibit no detrimental thermal effects. This approach integrates seamlessly with the industrial-matured manufacturing process and the buried-stressor technique, paving the way for exceptional scalability and straightforward manufacturing of high-ß microlasers and bright quantum light sources.

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