Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures

• Authors: ZAJÍČKOVÁ Lenka; PEŘINA Vratislav; BURŠÍKOVÁ Vilma; MACKOVÁ Anna; JANČA Jan
• Year of publication: 2000
• Type: Article in Proceedings
• Conference: Abstracts of Invited Lectures and Contributed Papers, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: Thin Films; PECVD; Hexamethyldisiloxane; RF discharge; RBS; ERD; FTIR; Polycarbonate
• Description: The composition of films, deposited from hexamethyldisiloxane/oxygen mixtures was studied by FTIR transmittance measurements, Rutherford backscattering method (RBS) and elastic recoil detection (ERD). Films were characterized by the ellipsometry, the morphology of the film surfaces was studied by SEM and the mechanical properties of films were characterized by Vickers indentation technique.

Related projects

• Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
• Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates