Publication details
Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor
| Authors | |
|---|---|
| Year of publication | 2001 |
| Type | Article in Proceedings |
| Conference | JUNIORMAT 01 |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | plasma;polymer;films;argon;acetylene;pecvd;pulsed;radio frequency;discharge;profile |
| Description | Plasma polymer films were deposited from Argon and acetylene mixture by plasma enhanced chemical vapor deposition (PECVD) in pulsed radio frequency (13.56 MHz) discharges. The discharge on time varied from 50-150 ms and the off time was kept constant at 1900 ms. Rf power during the on time was set for 20 W. Deposition profiles along tubular plug-flow reactor were studied by spectroscopic ellipsometry in ultraviolet/visible range on films deposited on the silicon substrates. |