Thermal stability of SiOxCyHz films prepared by PECVD

• Authors: KUČEROVÁ Zuzana; BURŠÍKOVÁ Vilma; ZAJÍČKOVÁ Lenka; FRANCLOVÁ Jana; PEŘINA Vratislav
• Year of publication: 2005
• Type: Article in Periodical
• Magazine / Source: Chemické listy
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: thermal stability; TDS; PECVD; FTIR; RBSW; ERDA
• Description: Thermal stability of SiOxCyHz films prepared using PECVD was studied by TDS, FTIR, RBS, ERDA and spectroscopic elipsometry.

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