Publication details
On Formation of Very Thin SiO2/a-Si:H/c-Si Structures by Plasma Immersion Ion Implantation and Dielectric Barrier Discharge
| Authors | |
|---|---|
| Year of publication | 2005 |
| Type | Article in Proceedings |
| Conference | Proc. SREN 2005 |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Description | On Formation of Very Thin SiO2/a-Si:H/c-Si Structures by Plasma Immersion Ion Implantation and Dielectric Barrier Discharge |