Publication details
Reduction of transient regime in fast preionized high power pulsed magnetron discharge
| Authors | |
|---|---|
| Year of publication | 2005 |
| Type | Article in Periodical |
| Magazine / Source | Europhysics Letters |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | pulsed magnetron; sputtering; preionization |
| Description | A high-power pulsed-magnetron discharge (several kW/cm2)is described. It operates at pulse duration of the order of few ľs, signicantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He bufer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few ľs which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to 10A/cm2 induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion ux to the substrate. Preliminary result on Cu deposit in trenches is reported. |
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