Study of Attachment and Detachment Reactions in Flowing Afterglow via Computer Simulation

• Authors: BRZOBOHATÝ Oto; TRUNEC David
• Year of publication: 2007
• Type: Article in Proceedings
• Conference: 16th Symposium on Application of Plasma Processes
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: attachment; detachment; flowing afterglow; computer simulation
• Description: In the present contribution attachment and detachment reactions of electrons on C6F5Cl molecule at two temperatures 467 K and 550 K are studied. These reactions were originally studied in so Flowing Afterglow Langmuir Probe (FALP) apparatus [1]. The measured data, i. e., time evolution of the electron concentration, and the attachment/detachment coefficients determined from the experiments were compared with our simulation results.

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