Influence of N2 and CH4 on depositon rate of boron based thin films prepared by magnetron sputtering

• Authors: ELIÁŠ Marek; SOUČEK Pavel; VAŠINA Petr
• Year of publication: 2008
• Type: Article in Periodical
• Magazine / Source: Chemické listy
• MU Faculty or unit: Faculty of Science
• Web: http://www.chemicke-listy.cz/ojs3/index.php/chemicke-listy/article/view/4322/4267
• Field: Plasma physics
• Keywords: hysteresis; reactive sputtering; hybrid deposition process
• Description: The paper study deposition rate of boron based thin films prepared by means of hybrid PVD-PECVD process and derive conclusions about process behaviour. Paper, interdisciplinary study of plasma physics

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