Publication details

Dynamics of UV degradation of PMPSi in vacuum and in the air using in-situ ellipsometry

Authors

FIKAROVÁ ZRZAVECKÁ Olga NEBOJSA Alois NAVRÁTIL Karel NEŠPŮREK Stanislav HUMLÍČEK Josef

Year of publication 2008
Type Article in Periodical
Magazine / Source physica status solidi (c)
MU Faculty or unit

Faculty of Science

Citation
Field Solid matter physics and magnetism
Keywords vacuum spectroscopic ellipsometry; ultraviolet exposure; PMPSi; polymers
Description We present a comparative study of UV degradation of poly[methyl(phenyl)silane] (PMPSi) thin films on Si substrate in HV and in the air. When exposed to UV light with energies around 3.6 eV, the Si backbone scission occurs. The degradation rate is influenced by the presence of oxygen, which is bonded to the Si atoms following the backbone scission. In our experiments, the samples were placed in an HV chamber and ellipsometric spectra were continuously recorded in the 3.3-5.0 eV range. The combined tungsten (halogen)-deuterium source ensuring a proper level of light intensity used for both exposition and measurement. During 100 hours exposures at atmospheric pressure, the PMPSi film degraded completely and its optical response did not change further. Degradation of the sample exposed in vacuum (at the pressure of 5 x 10-6 Pa) is slower and stops earlier. Ellipsometric technique allowed us to perform detailed studies of the degradation dynamics.
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