Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge

• Authors: TRUNEC David; ZAJÍČKOVÁ Lenka; BURŠÍKOVÁ Vilma; STUDNIČKA Filip; SŤAHEL Pavel; PRYSIAZHNYI Vadym; PEŘINA Vratislav; HOUDKOVÁ Jana; NAVRÁTIL Zdeněk; FRANTA Daniel
• Year of publication: 2010
• Type: Article in Periodical
• Magazine / Source: Journal of Physics D: Applied Physics
• MU Faculty or unit: Faculty of Science
• Web: http://iopscience.iop.org/0022-3727/43/22/225403/pdf/0022-3727_43_22_225403.pdf
• Field: Plasma physics
• Keywords: thin film deposition; atmospheric pressure discharge
• Description: An atmospheric pressure dielectric barrier discharge burning in nitrogen with a small admixture of hexamethyldisiloxane (HMDSO) was used for the deposition of thin organosilicon films. The thin films were deposited on glass, silicon and polycarbonate substrates, and the substrate temperature during the deposition process was increased up to values within the range 25 - 150 C in order to obtain hard SiOx-like thin films.

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