Behaviour of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene atmosphere

• Authors: SCHMIDTOVÁ Tereza; VAŠINA Petr
• Year of publication: 2010
• Type: Article in Proceedings
• Conference: Potential and Applications of Nanotretment of Medical Surface
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: magnetron sputtering; modelling; hybrid process; hysteresis
• Description: Hybrid PVD-PECVD sputtering process was studied for the case of titanium target sputtering in argon and acetylene atmosphere. The hybrid PVD-PECVD process combines aspects of conventional sputtering of metal target with hydrocarbon vapour as a source of carbon. We present and discuss significant differences between behaviour of conventional reactive magnetron sputtering and such hybrid process.

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