Nanocrystalline layer deposition by organometallic compound deposition in microwave discharges

• Authors: JAŠEK Ondřej; SYNEK Petr; KUDRLE Vít; ZELINA Peter; BURŠÍKOVÁ Vilma; DAVID Bohumil; PIZÚROVÁ Naděžda; HANZLÍKOVÁ Renata; REK Antonín
• Year of publication: 2010
• Type: Article in Proceedings
• Conference: Potential and applications of surface nanotreatment of polymers and glass : Book of Extended Abstracts
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: nanocrystalline layer; iron pentacarbonyl; plasma; low-pressure discharge; microwave discharge
• Description: Microwave plasma torch (2,45 GHz, 300 W power) operating at atmospheric pressure and low pressure (several kPa) surface wave microwave discharge are used for deposition of nanocrystalline layers on various substrates such as silicon or glass. Both discharges are ignited in Ar and organometallic compound is introduced into the discharge. Thin layers are deposited on the substrate placed in direction of the gas flow. In case of microwave plasma torch the deposition temperature is varied from 100 to 700 Celsius degrees. Deposited films are analyzed by scanning electron microscopy (SEM) and energy-dispersive x-ray (EDX) analysis. Mechanical properties of the films are also evaluated.

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