Publication details
Plasma deposition of hard carbon films from hydrogen or deuterium + methane mixtures
| Authors | |
|---|---|
| Year of publication | 2010 |
| Type | Conference abstract |
| MU Faculty or unit | |
| Citation | |
| Description | The aim of this work is to study and compare the deposition parameters of hydrogenated carbon thin films (HDLC) and deuterated carbon thin films (DDLC) deposited by radio frequency Plasma Enhanced Chemical Vapour Deposition (PECVD) from two different precursor mixtures hydrogen/methane (H2/CH4) and deuterium/methane (D2/CH4) on single crystalline silicon substrate. The depositions were performed from mixtures with different dilutions of methane, either in hydrogen or deuterium. We focused our work on advanced plasma diagnostics performed by means of Optical Emission Spectroscopy (OES). |