![Důležité termíny](https://cdn.muni.cz/media/3633704/image_2.jpg?mode=crop¢er=0.5,0.5&rnd=133572412150000000&heightratio=0.5&width=278)
prof. Mgr. Petr Vašina, Ph.D.
ředitel ústavu – Ústav fyziky a technologií plazmatu
kancelář: pav. 06/01025
Kotlářská 267/2
611 37 Brno
telefon: | 549 49 6479 |
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sociální a akademické sítě: |
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Počet publikací: 385
2010
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Plasma diagnostics using electron paramagnetic resonance
Journal of Physics D: Applied physics, rok: 2010, ročník: 43, vydání: 12
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Preparation of self-adhesive nc-TiC/a-C:H coatings
Potential and Applications of Thin Ceramic and Metal Coatings, rok: 2010
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Suppressed hysteresis behaviour of Ti sputtering in acetylene gas
Rok: 2010, druh: Konferenční abstrakty
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Time resolved investigations of high power pulsed microwave discharge in nitrogen and neon
Proceedings of 24th Symposium on Plasma Physics and Technology, rok: 2010
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Time resolved spectroscopy of high power pulsed microwave discharge in nitrogen
Proceedings of 20th Escampig, rok: 2010
2009
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Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process
Europhysics Letters, rok: 2009, ročník: 85, vydání: 1
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Higher harmonic frequencies of discharge voltages as extremely sensitive marker of state of RF reactive sputtering deposition process
Book of Contributed Papers of 17th Symposium on Applications of Plasma Processes, rok: 2009
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Higher harmonics of discharge voltage as tool to control accurately state of RF sputtering deposition process
Rok: 2009, druh: Konferenční abstrakty
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Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics
Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, rok: 2009
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Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?
Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts, rok: 2009