Informace o publikaci
Spatially resolved spectroscopy of atmospheric pressure microwave plasma jet used for surface treatment
| Autoři | |
|---|---|
| Rok publikování | 2013 |
| Druh | Konferenční abstrakty |
| Fakulta / Pracoviště MU | |
| Citace | |
| Popis | Material processing and modification by plasma enjoys ever increasing interest of industry. Mostly for the surface related applications, OH radical is the essential element that initiates the reactions and enhances hydrophilic properties of the surface. The information about its distribution in plasma can be a valuable clue for the most effective treatment. We have investigated OH band relative intensity 2D profiles in atmospheric pressure microwave plasma jet - surfatron - by means of optical emission spectroscopy (OES). |
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