Informace o publikaci
Nucleation and initial growth of atomic layer deposited titanium oxide determined by spectroscopic ellipsometry and the effect of pretreatment by surface barrier discharge
| Autoři | |
|---|---|
| Rok publikování | 2015 |
| Druh | Článek v odborném periodiku |
| Časopis / Zdroj | Applied Surface Science |
| Fakulta / Pracoviště MU | |
| Citace | |
| www | http://www.sciencedirect.com/science/article/pii/S016943321500731X |
| Doi | http://dx.doi.org/10.1016/j.apsusc.2015.03.135 |
| Obor | Fyzika plazmatu a výboje v plynech |
| Klíčová slova | Atomic layer deposition; Spectroscopic ellipsometry; Quantum confinement effects; Nucleation density |
| Popis | This paper reports on the use of spectroscopic ellipsometry to characterise the initial nucleation stage of the atomic layer deposition of the anatase phase of titanium dioxide on silicon substrates. |
| Související projekty: |