![Důležité termíny](https://cdn.muni.cz/media/3633704/image_2.jpg?mode=crop¢er=0.5,0.5&rnd=133572412150000000&heightratio=0.5&width=278)
Informace o publikaci
Pulsed-DC Magnetron Sputtering Process for Low Temperature Deposition of Hard Yet Moderately Ductile MoBC Coatings
Autoři | |
---|---|
Rok publikování | 2016 |
Druh | Konferenční abstrakty |
Fakulta / Pracoviště MU | |
Citace | |
Popis | Current state-of- materials nowadays used as protective coatings such as TiN, TiAlN, c-BN etc. generally exhibit high hardness and high stiffness. These positive features are often accompanied by undesirable brittle deformation behaviour. To overcome this limitation a new generation of materials with high hardness coupled with moderate ductility is desired. |
Související projekty: |