Informace o publikaci
Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide
| Autoři | |
|---|---|
| Rok publikování | 2016 |
| Druh | Článek v odborném periodiku |
| Časopis / Zdroj | Journal of materials science |
| Fakulta / Pracoviště MU | |
| Citace | |
| www | http://link.springer.com/article/10.1007%2Fs10853-015-9648-y |
| Doi | http://dx.doi.org/10.1007/s10853-015-9648-y |
| Obor | Elektronika a optoelektronika, elektrotechnika |
| Klíčová slova | titanium; sputtering; x-ray diffraction |
| Popis | We propose the ion-beam sputtering deposition providing Ti thin films of desired crystallographic orientation and smooth surface morphology not obtainable with conventional deposition techniques such as magnetron sputtering and vacuum evaporation. |
| Související projekty: |