Informace o publikaci
Optical spectroscopy for sputtering process characterization
| Autoři | |
|---|---|
| Rok publikování | 2020 |
| Druh | Článek v odborném periodiku |
| Časopis / Zdroj | Journal of Applied Physics |
| Fakulta / Pracoviště MU | |
| Citace | |
| www | https://aip.scitation.org/doi/10.1063/5.0006586 |
| Doi | http://dx.doi.org/10.1063/5.0006586 |
| Klíčová slova | magnetron sputtering; HiPIMS; spectroscopy; plasma diagnostics; sputtering process |
| Popis | In this Tutorial, various methods of optical spectroscopy representing certain interest for magnetron discharge characterization are overviewed. The main principles, the implementation examples, and the selected results are given for each technique, accompanied by short discussions and suggestions for further reading. Both passive and active optical methods are covered, including optical absorption and laser-based techniques. The advantages and drawbacks of each diagnostic approach are critically analyzed. Special attention is devoted to the techniques extensively used by the authors in their own work, such as line ratio methods, absorption spectroscopy, interferometry, and laser-induced fluorescence. |
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