Informace o publikaci
NOVEL INDUSTRIAL SPUTTERING TECHNOLOGY WITH VERY HIGH IONIZED FLUX FRACTION OF DEPOSITED MATERIAL
| Autoři | |
|---|---|
| Rok publikování | 2023 |
| Druh | Konferenční abstrakty |
| Fakulta / Pracoviště MU | |
| Citace | |
| Popis | PLATIT Pi411 PLUS is an extremely flexible coating unit. It can be operated in several different configurations what enables deposition of broad range of various PVD and PECVD coatings. Besides cathodic arc evaporation, this unit also offers magnetron sputtering by even two distinct sputtering technologies – well-established PLATIT SCIL technology and novel PLATIT F-Type technology. Common base for SCIL and F-Type is the central rotating cylindrical cathode with very efficient target cooling. Whereas in the case of SCIL the magnetic field design corresponds to more or less conventional cylindrical arrangement, F-Type is equipped with a specific moveable magnetic core. As the core is periodically moving along the cathode axis, the total applied power is instantaneously concentrated into the limited area of the target in the vicinity of this core. It results in the possibility to reach very high power densities, especially for industrial DC magnetron sputtering. For the delivered power of 25 kW the maximal value of power density goes up to 800 W/cm2, what is comparable with typical HIPIMS conditions. SCIL and F-Type technologies will be described in more detail and compared in terms of their specific properties. |