Informace o publikaci
Investigation of ionized metal flux fraction at industrial conditions
| Autoři | |
|---|---|
| Rok publikování | 2023 |
| Druh | Konferenční abstrakty |
| Fakulta / Pracoviště MU | |
| Citace | |
| Popis | Ionized metal flux fractions (IMFF) were analysed by a biasable quartz crystal microbalance and the saturated ion flux was measured by flat Langmuir probe. The experiments were performed at industrial conditions employing deposition system Pi411 developed by Platit AG company, which was equipped with a titanium cylindrical rotating target with a racetrack area of approx. 100 cm2. A very efficient target cooling system allowed to deliver the DC power of up to 35 kW to the central sputtering cathode, which resulted in an ionized metal flux fraction of 23 percent measured at the substrate level. This value is extremely high and is close to the values achieved typically by high power impulse magnetron sputtering (HiPIMS) technology. The measurement of this high value contradicts the generally accepted statement that the IMFF in a DC magnetron sputtering is typically only a few percent at the substrate level. It is explained by the possibility of using extremely high-power density due to the technical advantages of this equipment. In this contribution, we also show the results of a systematic study where the dependence of the IMFF on the pressure and power supplied to the target was investigated. IMFF increases linearly with power and decreases slightly with pressure. We also show the possibility to increase the IMFF by up to 10 percent using a hybrid deposition system combining lateral glow discharge with magnetron sputtering, which allows to independently control the ion and the neutral fluxes on the substrate. |
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