Informace o publikaci

Deposition of nanocomposite carbon-based thin films doped with copper and fluorine

Logo poskytovatele
Autoři

PŘIBYL Roman KELAROVÁ Štěpánka KARKUŠ Martin BURŠÍKOVÁ Vilma

Rok publikování 2024
Druh Článek v odborném periodiku
Časopis / Zdroj Carbon Trends
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www https://www.sciencedirect.com/science/article/pii/S266705692400097X
Doi http://dx.doi.org/10.1016/j.cartre.2024.100416
Klíčová slova Thin films; PECVD; Copper doped carbon-based films; Fluorine doped carbon-based films; RF glow discharge
Popis This paper is focused on plasma-enhanced chemical vapor deposition (PECVD) of novel carbon-based thin films. Unique thin films were deposited from a mixture of methane, hydrogen, and a precursor containing fluorine and copper: (hfac)copperVTMS (hfac = hexafluoroacetylacetonato and VTMS = vinyltrimethylsilane). Using the (hfac)copperVTMS precursor in PECVD deposition results in the advantageous chemical composition of carbon-based thin films while maintaining sufficient mechanical properties. Furthermore, with optimized plasma parameters, the films deposited on the substrate exhibit a nanocomposite structure. This nanostructured surface can increase the surface area, which is beneficial for various applications, including antibacterial and antiviral properties. The radiofrequency glow discharge at low pressure (? 70 Pa) and power P = 25W and P = 250W was used for deposition. Deposited thin films were analyzed using X-ray photoelectron spectroscopy, water contact angle measurement, atomic force microscopy, and nanoindentation techniques. Despite the doping of carbon-based thin films with soft copper, the prepared films exhibited sufficient mechanical properties, which are crucial for the future implementation of this deposition process.
Související projekty:

Používáte starou verzi internetového prohlížeče. Doporučujeme aktualizovat Váš prohlížeč na nejnovější verzi.

Další info