Informace o publikaci
Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies
| Název česky | Spektroskopická elipsometrie a odrazivost statisticky drsných povrchů vykazující široký interval prostorových frekvencí |
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| Autoři | |
| Rok publikování | 2008 |
| Druh | Článek v odborném periodiku |
| Časopis / Zdroj | physica status solidi (c) |
| Fakulta / Pracoviště MU | |
| Citace | |
| Obor | Optika, masery a lasery |
| Klíčová slova | ellipsometry; spectrophotometry; rough surfaces |
| Popis | Two optical methods for the optical characterization of the statistically rough surfaces exhibiting wide intervals of spatial frequencies are presented. These methods employ the combination of variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. The first method is based on combining the scalar diffraction theory and effective medium theory while the second method combines the scalar diffraction theory with Rayleigh-Rice theory. Both the methods are applied to the optical characterization of statistically rough GaAs surfaces prepared by thermal oxidation. It is shown that both the methods can be utilized for characterization of these surfaces in a reasonable way, however, the latter is more suitable for this purpose. The results of the optical characterization of the selected rough GaAs surface are supported by those obtained using atomic force microscopy. |
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