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Nanoindentation studies on amorphous carbon films prepared using plasma enchanced chemical vapor deposition
Autoři | |
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Rok publikování | 2008 |
Druh | Konferenční abstrakty |
Fakulta / Pracoviště MU | |
Citace | |
Popis | In the past two decades, there is a great industrial interest in preparation of amorphous hydrogenated carbon (a-C:H) thin films in a wide range of applications such as nanoelectronics, optical devices, integrated digital circuits, micro-electromechanical devices (MEMs), biomedical coatings, etc. The mechanical properties such as hardness, wear resistance, fracture toughness, film-substrate adhesion, thermo-mechanical stability of the coating-substrate system play always a crucial role for industrial applications of the films. |
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