Project information
A study of multilayers of ultra-thin films using X-ray photoelectron spectroscopy and x-ray reflectivity

The project proposal suggests to study multilayers of ultra-thin films with an overall thickness below 10 nm by two complementary non-destructive techniques, such as Angle Resolved XPS (AR XPS) and X-ray Optical Reflectivity (XRR). While the latter technique has already become popular in analysis of multilayers, until now AR XPS has not been used yet in depth profiling of multilayers. To improve depth resolution accuracy of AR XPS (needed for multilayer analysis), a maximum entropy method which is robust to experimental noise and not restricted to small numbers of components will be used for deconvolution of composition depth profiles of multilayers. Applying these two complementary experimental methods, the accuracy of the analysis might be significantly improved. This is especially true for materials, atoms of which chemically react in the area of interfaces and form complex chemical compounds and structures. In the case of successful implementation of this novel approach, geometrical and