Project information
Multi-pulse HiPIMS for increase of deposition rate
- Project Identification
- MUNI/31/DP1/2020
- Project Period
- 7/2020 - 12/2020
- Investor / Pogramme / Project type
-
Masaryk University
- Internal projects of the Faculty of Science
- National Centre of Competence for Materials, Advanced Technologies, Coatings and their Applications - sub-projects
- MU Faculty or unit
- Faculty of Science
- Cooperating Organization
-
Institute of Physics of the ASCR, v. v. i.
- Responsible person Martin Čada
The project aims to increase the deposition rate in HiPIMS discharge, which is significantly low compared to standard direct current magnetron sputtering (dcMS) while maintaining sufficient ionization of the sputtered species, which is considerably higher compared to dcMS. The low deposition rate is a significant disadvantage of HiPIMS as it increases the cost of deposited layers. Therefore, a higher deposition rate will make the deposition process more economical and efficient, maintaining enhanced properties of deposited thin films.
The sub-project directly fulfills research topic of "Advanced Materials and Nanotechnology".
Sustainable Development Goals
Masaryk University is committed to the UN Sustainable Development Goals, which aim to improve the conditions and quality of life on our planet by 2030.
