The project aims to increase the deposition rate in HiPIMS discharge, which is significantly low compared to standard direct current magnetron sputtering (dcMS) while maintaining sufficient ionization of the sputtered species, which is considerably higher compared to dcMS. The low deposition rate is a significant disadvantage of HiPIMS as it increases the cost of deposited layers. Therefore, a higher deposition rate will make the deposition process more economical and efficient, maintaining enhanced properties of deposited thin films.

The sub-project directly fulfills research topic of "Advanced Materials and Nanotechnology".

Cíle udržitelného rozvoje

Masarykova univerzita se hlásí k cílům udržitelného rozvoje OSN, jejichž záměrem je do roku 2030 zlepšit podmínky a kvalitu života na naší planetě.