Publication details
Zařízení pro měření tloušťky polovodičových vrstevnatých struktur SOI
| Title in English | Apparatus to measure thickness of SOI semiconductor layered structures |
|---|---|
| Authors | |
| Year of publication | 2014 |
| MU Faculty or unit | |
| web | http://spisy.upv.cz/UtilityModels/FullDocuments/FDUM0027/uv027013.pdf |
| Description | Technical solution targets measurements of thickness of SOI layered semiconductor structures through optical means in VIS/NIR range with precision of 30 nm in 1-10 micron range; it comprises a light source, optical fibers, scanner, spectrometer, control electronics and computer |
| Related projects: |