Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

• Authors: SCHÄFER Jan; HNILICA Jaroslav; ŠPERKA Jiří; QUADE Antje; KUDRLE Vít; FOEST Rüdiger; VODÁK Jiří; ZAJÍČKOVÁ Lenka
• Year of publication: 2016
• Type: Article in Periodical
• Magazine / Source: Surface and Coatings Technology
• MU Faculty or unit: Faculty of Science
• Doi: http://dx.doi.org/10.1016/j.surfcoat.2015.09.047
• Field: Plasma physics
• Keywords: Tetrakis(trimethylsilyloxy)silane; Tetrakis(trimethylsiloxy)silane; Plasma jet; Silicon dioxide

Attached files

• 1-s2.0-S0257897215302851-main.pdf

• Description: We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a radiofrequency and a microwave plasma jets operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS).

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