Publication details
Low-temperature reduction of Graphene Oxide by atmospheric pressure hydrogen plasma
| Authors | |
|---|---|
| Year of publication | 2016 |
| Type | Article in Proceedings |
| MU Faculty or unit | |
| Citation | |
| Web | https://www.escampig2016.org |
| Field | Plasma physics |
| Keywords | graphene oxide, hydrogen plasma, atmospheric pressure, DCSBD |
| Description | The non-equilibrium hydrogen plasma generated at atmospheric pressure using Diffuse Coplanar Surface Barier Discharge (DCSBD) was used as an alternative low-temperature method for reduction of Graphene Oxide (GO). GO layers were prepared by modified Hummers method and deposited on Si/SiO 2 substrate by modified Langmuir-Schaefer method. Extremely short reduction times (<5 s) in hydrogen DCSBD plasma led to the similar level of GO reduction as obtained after the commonly used thermal vacuum annealing method for 30 minutes. |