Publication details

Strain Engineering in Highly Mismatched SiGe/Si Heterostructures

Authors

ISA Fabio JUNG Arik SALVALAGLIO Marco DASILVA Yadira Arroyo Rojas MAROZAU Ivan MEDUŇA Mojmír BARGET Michael MARZEGALLI Anna ISELLA Giovanni ERNI Rolf PEZZOLI Fabio BONERA Emiliano NIEDERMANN Philippe SEREDA Olha GRONING Pierangelo MONTALENTI Francesco VON KAENEL Hans

Year of publication 2017
Type Article in Periodical
Magazine / Source Materials Science in Semiconductor Processing
MU Faculty or unit

Faculty of Science

Citation
web http://www.sciencedirect.com/science/article/pii/S1369800116303201?via%3Dihub
Doi http://dx.doi.org/10.1016/j.mssp.2016.08.019
Field Solid matter physics and magnetism
Keywords Strain engineering; Dislocations; Elastic relaxation; Patterned substrates; SiGe
Description In this work we present an innovative approach to realise coherent, highly-mismatched 3-dimensional heterostructures on substrates patterned at the micrometre-scale.

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