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Publication details
Strain Engineering in Highly Mismatched SiGe/Si Heterostructures
Authors | |
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Year of publication | 2017 |
Type | Article in Periodical |
Magazine / Source | Materials Science in Semiconductor Processing |
MU Faculty or unit | |
Citation | |
Web | http://www.sciencedirect.com/science/article/pii/S1369800116303201?via%3Dihub |
Doi | http://dx.doi.org/10.1016/j.mssp.2016.08.019 |
Field | Solid matter physics and magnetism |
Keywords | Strain engineering; Dislocations; Elastic relaxation; Patterned substrates; SiGe |
Description | In this work we present an innovative approach to realise coherent, highly-mismatched 3-dimensional heterostructures on substrates patterned at the micrometre-scale. |