Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon

• Authors: FALUB Claudiu V.; PIETAMBARAM Srinivas V.; YILDIRIM Oguz; MEDUŇA Mojmír; CAHA Ondřej; HIDA Rachid; ZHAO Xue; AMBROSINI Jan; ROHRMANN Hartmut; HUG Hans J.
• Year of publication: 2019
• Type: Article in Periodical
• Magazine / Source: AIP Advances
• MU Faculty or unit: Faculty of Science
• web: Full Text
• Doi: http://dx.doi.org/10.1063/1.5079477
• Keywords: Magnetic hysteresis; Metal oxides; X-ray diffraction; Magnetron sputtering; X-ray reflectivity; X-ray fluorescence
• Description: We have studied the structural and magnetic properties of enhanced-permeability-dielectric (EPD) FeCo/Al2O3-multilayer thin films deposited on 8”-Si wafers in an industrial magnetron sputtering system.

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