Publication details

Metody měření polovodičových součástek: rtg, optická spektroskopie

Investor logo
Title in English Masurement methods of semiconductor devices: X-ray, optical spectroscopy
Authors

CAHA Ondřej HUMLÍČEK Josef

Year of publication 2020
Type Research and development projects
MU Faculty or unit

Central European Institute of Technology

Citation
Description The report deals with methods of semiconductor material analysis. X-ray diffraction methods of elastic strain determination, doping inhomogeneities is highly doped silicon. The optical spectroscopy was used to determine impurity concentration in highly doped silicon wafers.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info

By clicking “Accept Cookies”, you agree to the storing of cookies on your device to enhance site navigation, analyze site usage, and assist in our marketing efforts. Cookie Settings

Necessary Only Accept Cookies