You are here:
Publication details
Depozice a charakterizace tenkých vrstev připravených ze směsi TEOS+O2 ve vf plazmatu
Title in English | RF plasma deposition and characterization of organosilicon thin films from TEOS + O2 gas mixture |
---|---|
Authors | |
Year of publication | 1995 |
Type | Chapter of a book |
MU Faculty or unit | |
Citation | |
Related projects: |