Publication details
Characterisation of DLC Films Prepared by PECVD
| Authors | |
|---|---|
| Year of publication | 1999 |
| Type | Article in Proceedings |
| Conference | Proceedings of 12th Symposium on Application of Plasma Processes |
| MU Faculty or unit | |
| Citation | |
| Web | http://hydra.physics.muni.cz/~franta/bib/SAPP12_158.html |
| Field | Plasma physics |
| Description | Multi-sample modification of variable angle of incidence spectroscopic ellipsometry (VASE) was used to characterize diamond like carbon (DLC) films prepared by plasma enhanced chemical vapor deposition (PECVD). These films were prepared on wafers of silicon single crystal in the planar capacitively coupled RF reactor. The gas feed for deposition was a mixture of methane (CH4) and argon (Ar). |
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