Publication details
Plasma enhanced CVD of organisilicon plasma polymers
| Authors | |
|---|---|
| Year of publication | 2003 |
| Type | Article in Proceedings |
| Conference | WDS 03 Proceedings of contributed papers: Part II. Physics of Plasmas and Ionized media |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | PECVD; FTIR; HMDSO; SiOx |
| Description | We deposited organisilicon plasma polymer films from hexamethyldisiloxane (HMDSO) and HMDSO/O2 mixtures by plasma enhanced CVD method. Optical constants in ultraviolet-visible range were obtained by spectroscopic ellipsometry. Fourier transform infrared measurements were performed to characterize chemical bonds in the films. |