![Důležité termíny](https://cdn.muni.cz/media/3633704/image_2.jpg?mode=crop¢er=0.5,0.5&rnd=133572412150000000&heightratio=0.5&width=278)
Informace o publikaci
Plasma enhanced CVD of organisilicon plasma polymers
Autoři | |
---|---|
Rok publikování | 2003 |
Druh | Článek ve sborníku |
Konference | WDS 03 Proceedings of contributed papers: Part II. Physics of Plasmas and Ionized media |
Fakulta / Pracoviště MU | |
Citace | |
Obor | Fyzika plazmatu a výboje v plynech |
Klíčová slova | PECVD; FTIR; HMDSO; SiOx |
Popis | We deposited organisilicon plasma polymer films from hexamethyldisiloxane (HMDSO) and HMDSO/O2 mixtures by plasma enhanced CVD method. Optical constants in ultraviolet-visible range were obtained by spectroscopic ellipsometry. Fourier transform infrared measurements were performed to characterize chemical bonds in the films. |