Publication details
Preionised pulsed magnetron discharges for ionised physical vapour deposition
| Authors | |
|---|---|
| Year of publication | 2005 |
| Type | Article in Periodical |
| Magazine / Source | Journal of Optoelectronics and Advanced Materials |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | pulsed magnetron; preionization; transport processes |
| Description | To improve the quality of thin film deposition by magnetron discharges, particularly by an effective ionisation of the sputtered vapour, we developed a new ionised physical vapour deposition (IPVD) method based on preionised Pulsed magnetron discharges. By superposition of continuous, microwave or RF discharge, with a fast pulsed abnormal discharge, target current density is extended to very high values during short pulses. Efficient vapour ionisation is obtained and due to the current pulse shortness, electric arc development is avoided. |
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