Publication details
Electrical Properties of Plasma Deposited Thin Films
| Authors | |
|---|---|
| Year of publication | 2005 |
| Type | Monograph |
| MU Faculty or unit | |
| Citation | |
| Description | It is well known that MIM structures exhibit various high-field processes, which may be either electrode-limited (e.g. tunneling, Schottky-barrier emission) or bulk-limited (e.g. space-charge-limited conduction, Poole-Frenkel conduction). Thin films prepared using PECVD exhibited Pool-Frenkel conductivity (Schottky conductivity) at lower voltages and Fowler-Nordheim tunneling at higher voltages. |
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