Publication details

Structural properties of ultra-low-energy ion-implanted silicon studied by combined X-ray scattering methods

Authors

HOLÝ Václav METZGER Till H. CAPELLO Luciana

Year of publication 2006
Type Article in Periodical
Magazine / Source Journal of Applied Crystallography
MU Faculty or unit

Faculty of Science

Citation
Field Solid matter physics and magnetism
Keywords Structural properties of ultra-low-energy ion-implanted silicon studied by combined X-ray scattering methods
Description Structural properties of ultra-low-energy ion-implanted silicon studied by combined X-ray scattering methods

You are running an old browser version. We recommend updating your browser to its latest version.

More info

By clicking “Accept Cookies”, you agree to the storing of cookies on your device to enhance site navigation, analyze site usage, and assist in our marketing efforts. Cookie Settings

Necessary Only Accept Cookies