Publication details
Photonic band-gap masks to enhance resolution and depth of focus
| Authors | |
|---|---|
| Year of publication | 2007 |
| Type | Article in Periodical |
| Magazine / Source | Proceedings of SPIE |
| MU Faculty or unit | |
| Citation | |
| Field | Optics, masers and lasers |
| Keywords | lithographic mask; photonic band-gap |
| Description | The authors introduce initial simulation work on Photonic Bandgap Enhanced or PBE reticles that tends to address the manufacturing problems associated with typical PSM reticles while improving potential resolution capabilities to 35 and 25 nm utilizing 193 nm immersion lithography. The proposed approach for manufacturing reduces the overall defect issues associated with PSM approaches. |